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Proceedings Paper

Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA
Author(s): Jason Hsih-Chie Chang; Charlie Chung-Ping Chen; Lawrence S. Melvin
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Paper Abstract

Resolution enhancement technologies (RETs) are so far widely proposed in improving the quality of micro-lithography process. Latest methods such as source mask optimization (SMO) and inverse lithography technology (ILT) are gaining popularity recently. Therefore, high speed simulator is in strong demand for growing computational complexity of RETs. In this paper, we demonstrate that our previously proposed Abbe-PCA is highly efficient for source configuring and pixel-based ILT mask tuning.

Paper Details

Date Published: 13 March 2010
PDF: 10 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 764026 (13 March 2010); doi: 10.1117/12.846615
Show Author Affiliations
Jason Hsih-Chie Chang, National Taiwan Univ. (Taiwan)
Charlie Chung-Ping Chen, National Taiwan Univ. (Taiwan)
Lawrence S. Melvin, Synopsys (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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