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Proceedings Paper

Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source
Author(s): J. Sporre; V. Surla; M. J. Neumann; D. N. Ruzic; L. Ren; F. Goodwin
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Paper Abstract

For extreme ultraviolet light lithography to be a viable process for the future development of computer chips, it is necessary that clean photons are produced at the intermediate focus (IF). To measure the flux at the IF, the Center for Plasma-Material Interactiosn (CPMI) at the University of Illinois at Urbana-Champaign has developed a Sn IF flux emission detector (SNIFFED) apparatus that is capable of measuring charged and neutral particle flux at the IF. Results will be presented that diagnose debris produced at the IF, as well as methods by which this debris can be mitigated. Advanced Materials Research Center, AMRC, International SEMATECH Manufacturing Initiative, and ISMI are servicemarks of SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.

Paper Details

Date Published: 20 March 2010
PDF: 12 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763611 (20 March 2010); doi: 10.1117/12.846590
Show Author Affiliations
J. Sporre, Univ. of Illinois at Urbana-Champaign (United States)
V. Surla, Univ. of Illinois at Urbana-Champaign (United States)
M. J. Neumann, Univ. of Illinois at Urbana-Champaign (United States)
D. N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)
L. Ren, SEMATECH North (United States)
F. Goodwin, SEMATECH North (United States)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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