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Proceedings Paper

Development of an ultrasonic system for super-precise measurement of zero-CTE temperature of EUVL-grade TiO2-SiO2 ultra-low-expansion glasses
Author(s): Jun-ichi Kushibiki; Mototaka Arakawa; Yuji Ohashi; Toshio Sannomiya; Yuko Maruyama
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Paper Abstract

This paper presents the development of a practical system for super-precise evaluation of zero-CTE temperatures T(zero- CTE) of TiO2-SiO2 glasses for extreme ultraviolet lithography (EUVL) by measuring leaky surface-acoustic-wave (LSAW) velocity VLSAW with a line-focus-beam ultrasonic material characterization (LFB-UMC) system. This new system can evaluate T(zero-CTE) from 20 to 150°C on the surfaces of glass substrates for photomasks and optical mirrors located at different positions in EUVL systems. This system operates in a stabilized temperature measurement environment (e.g., 23.00°C). It was demonstrated at 225 MHz for homogenized TiO2-SiO2 glass specimens with different annealing temperatures and realized an extremely homogeneous glass ingot with a ΔT(zero-CTE) of 1.6°C around 23.2°C. This ultrasonic system enables both glass manufacturers and users to speedily inspect all glass substrates with reliable data of T(zero-CTE).

Paper Details

Date Published: 23 March 2010
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362M (23 March 2010); doi: 10.1117/12.846570
Show Author Affiliations
Jun-ichi Kushibiki, Tohoku Univ. (Japan)
Mototaka Arakawa, Tohoku Univ. (Japan)
Yuji Ohashi, Tohoku Univ. (Japan)
Toshio Sannomiya, Tohoku Univ. (Japan)
Yuko Maruyama, Tohoku Univ. (Japan)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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