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Proceedings Paper

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design
Author(s): Jue-Chin Yu; Peichen Yu
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Paper Abstract

Convergence speed and local minimum issue have been the major issues for inverse lithography. In this paper, we propose an inverse algorithm that employs an iterative gradient-descent method to improve convergence and reduce the Edge Placement Error (EPE). The algorithm employs a constrained gradient-based optimization to attain the fast converging speed, while a cross-weighting technique is introduced to overcome the local minimum trapping.

Paper Details

Date Published: 4 March 2010
PDF: 11 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76402L (4 March 2010); doi: 10.1117/12.846568
Show Author Affiliations
Jue-Chin Yu, National Chiao Tung Univ. (Taiwan)
Peichen Yu, National Chiao Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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