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Proceedings Paper

High reflectance multilayers for EUVL HVM-projection optics
Author(s): E. Louis; E. D. van Hattum; S. Alonso van der Westen; P. Sallé; K. T. Grootkarzijn; E. Zoethout; F. Bijkerk; G. von Blanckenhagen; S. Müllender
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Paper Abstract

Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 68%, with a maximum value of 69.6% and a non-correctable figure error added by the full multilayer stack of better than 35 picometer. The results are compared to the earlier coatings of the EUVL Process Development Tool.

Paper Details

Date Published: 23 March 2010
PDF: 5 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362T (23 March 2010); doi: 10.1117/12.846566
Show Author Affiliations
E. Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
E. D. van Hattum, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
S. Alonso van der Westen, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
P. Sallé, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
K. T. Grootkarzijn, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
E. Zoethout, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
F. Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Univ. Twente (Netherlands)
G. von Blanckenhagen, Carl Zeiss SMT AG (Germany)
S. Müllender, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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