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Proceedings Paper

EUV-multilayers on grating-like topographies
Author(s): A. J. R. van den Boogaard; E. Louis; K. A. Goldberg; I. Mochi; F. Bijkerk
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Paper Abstract

In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources.

Paper Details

Date Published: 23 March 2010
PDF: 5 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362S (23 March 2010); doi: 10.1117/12.846564
Show Author Affiliations
A. J. R. van den Boogaard, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
E. Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
K. A. Goldberg, Lawrence Berkeley National Lab. (United States)
I. Mochi, Lawrence Berkeley National Lab. (United States)
F. Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Univ. Twente (Netherlands)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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