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Proceedings Paper

Tin ion and neutral dynamics within an LPP EUV source
Author(s): Bob Rollinger; Oran Morris; Ndaona Chokani; Reza S. Abhari
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Paper Abstract

The life-time of normal incidence collectors used in LPP EUV sources has been computationally investigated. A two-dimensional/ axisymmetric hydrodynamic-particle code is used to model the plasma expansion from the laser-droplet interaction up to the collector optic. The plasma is formed from the interaction of a Nd:YAG laser, operating at the fundamental frequency, with 50μm tin droplets. The simulation results show non-uniform mass-density distributions at the end of the laser pulse. As the expansion continues up to the collector, the non-uniformities continue to develop. Sn5+ is the most energetic ion impinging on the collector, with kinetic energies up to 7keV. The sputtering yields for Sn ions onto Mo and Si show a strong dependence on both the ion energy and their impact angle. The deposition of neutral tin atoms on the collector has also been assessed with a large scale hydrodynamic simulation. These results are used to investigate the build-up of tin vapor at the irradiation site.

Paper Details

Date Published: 22 March 2010
PDF: 10 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76363F (22 March 2010); doi: 10.1117/12.846557
Show Author Affiliations
Bob Rollinger, ETH Zürich (Switzerland)
Oran Morris, ETH Zürich (Switzerland)
Ndaona Chokani, ETH Zürich (Switzerland)
Reza S. Abhari, ETH Zürich (Switzerland)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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