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Proceedings Paper

In-situ EUV plasma debris mitigation
Author(s): Robert Lofgren; Martin J. Neumann; David N. Ruzic
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Paper Details

Date Published:
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Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76363E; doi: 10.1117/12.846554
Show Author Affiliations
Robert Lofgren, Univ. of Illinois at Urbana-Champaign (United States)
Martin J. Neumann, Univ. of Illinois at Urbana-Champaign (United States)
David N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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