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Proceedings Paper

The impact of optical non-idealities in litho-litho-etch processing
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Paper Abstract

Experimental work reveals that a thermal cure freeze process can alter the refractive index of a 1st pass LLE resist designed for that purpose. Although negligible change in the real index (n) is observed at the actinic wavelength, a 20% increase in the imaginary index (k) occurred. It is also experimentally determined that a second pass resist coated over a frozen first layer, may have a planar or non-planar surface, depending upon its' formulation. Simulation studies show that a non-planarizing 2nd resist will exhibit lensing effects which result in the 2nd pass resist feature showing sensitivity to the CD and profile of the embedded resist features. Other simulations suggest that both non-planar 2nd resist surfaces and mismatching resist n & k values can have a negative impact on the alignment sensitivity of a LLE double patterning process.

Paper Details

Date Published: 10 March 2010
PDF: 9 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76400G (10 March 2010); doi: 10.1117/12.846553
Show Author Affiliations
Stewart A. Robertson, KLA-Tencor Corp. (United States)
Michael T. Reilly, DOW Electronic Materials (United States)
Trey Graves, KLA-Tencor Corp. (United States)
Mark D. Smith, KLA-Tencor Corp. (United States)
John J. Biafore, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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