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Proceedings Paper

Electrostatic chucking of EUVL masks: coefficients of friction
Author(s): Gerhard Kalkowski; Christian Semmler; Stefan Risse; Thomas Peschel; Christoph Damm; Sandra Müller; René Bauer
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Paper Abstract

In extreme ultraviolet lithography (EUVL), the mask hangs on an electrostatic chuck and is moved laterally during exposition. For proper control of the chucked mask under corresponding inertial forces, static friction of the mask on the chuck is critical and an important input parameter for reliable theoretical modelling. To determine static and dynamic friction values, measurements were performed in vacuum on a mask blank with a test chuck, smaller than a real EUVL mask chuck, but otherwise nearly identical in its characteristics. Experimental results were obtained at various voltages for a materials combination of Low Thermal Expansion Glass (LTEM) for the pin chuck surface and a mask blank with a chromium metal backside metallisation, respectively. Dynamic friction was found to be only marginally smaller than static friction and values in the range from 0.27 to 0.33 were determined for the static friction coefficient under vacuum conditions.

Paper Details

Date Published: 23 March 2010
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362J (23 March 2010); doi: 10.1117/12.846530
Show Author Affiliations
Gerhard Kalkowski, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Christian Semmler, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Stefan Risse, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Thomas Peschel, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Christoph Damm, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Sandra Müller, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
René Bauer, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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