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Proceedings Paper

Multi-shaped beam proof of lithography
Author(s): Matthias Slodowski; Hans-Joachim Doering; Wolfgang Dorl; Ines A. Stolberg
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Paper Abstract

In this paper a full package high throughput multi electron-beam approach, called Multi Shaped Beam (MSB), for applications in mask making as well as direct write will be presented including complex proof-of-lithography results. The basic concept enables a significant exposure shot count reduction for advanced patterns compared to standard Variable Shaped Beam (VSB) systems and allows full pattern flexibility by concurrently using MSB, VSB and Cell Projection (CP). Proof of lithography results will be presented, which have been performed using a fully operational electron-beam lithography system including data path and substrate scanning by x/y-stage movement.

Paper Details

Date Published: 2 April 2010
PDF: 10 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 763715 (2 April 2010); doi: 10.1117/12.846529
Show Author Affiliations
Matthias Slodowski, Vistec Electron Beam GmbH (Germany)
Hans-Joachim Doering, Vistec Electron Beam GmbH (Germany)
Wolfgang Dorl, Vistec Electron Beam GmbH (Germany)
Ines A. Stolberg, Vistec Electron Beam GmbH (Germany)

Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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