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Proceedings Paper

Meso-scale simulation of the line-edge structure based on polymer chains in the developing and rinse process
Author(s): Hiroshi Morita; Masao Doi
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Paper Abstract

To study the line edge roughness, we developed the simulation method of formation process of line edge based on the meso-scale simulation of dissipative particle dynamics (DPD) method. We modeled the development and rinse processes based on the coarse-grained polymer model. It is important that the block copolymer in which the soluble and insoluble blocks are bonded exists at the line edge. Though the soluble part of this block copolymer is stretched out in the developing process, it becomes shrunk in the rinse process. The shrunk polymers contribute to the formation of line edge, and LER was much influenced by these polymers. These simulations will represent the formation process of line edge based on the polymer chain dynamics.

Paper Details

Date Published: 25 March 2010
PDF: 9 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763932 (25 March 2010); doi: 10.1117/12.846526
Show Author Affiliations
Hiroshi Morita, National Institute of Advanced Industrial Science and Technology (Japan)
Masao Doi, The Univ. of Tokyo (Japan)

Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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