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Proceedings Paper

Modeling of exploration of reversible contrast enhancement layers for double exposure lithography
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Paper Abstract

This paper discusses the modeling of reversible contrast enhancement layers (RCEL) for advanced optical lithography. An efficient implementation of the Waveguide method is employed to investigate the process capability of RCEL and to identify the most appropriate material and exposure parameters. It is demonstrated that the consideration of near field diffraction effects and of bleaching dynamics is important to achieve correct results. A large refractive index of the resist and the RCEL improves the achievable lithographic performance. It is shown that RCEL layers can be used to enhance the performance of a NA=0.6 scanner to create a high contrast images with a pitch of 80nm.

Paper Details

Date Published: 11 March 2010
PDF: 12 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76400J (11 March 2010); doi: 10.1117/12.846525
Show Author Affiliations
Feng Shao, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Gregory D. Cooper, Pixelligent Technologies LLC (United States)
Zhiyun Chen, Pixelligent Technologies LLC (United States)
Andreas Erdmann, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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