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Proceedings Paper

Macroscopic and stochastic modeling approaches to pattern doubling by acid catalyzed cross-linking
Author(s): Jürgen Fuhrmann; André Fiebach; George P. Patsis
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Paper Abstract

Pattern doubling by cross-linking of a spacer triggered by residual acid diffusion from a previously developed primary structure into the spacer is a possible option to create structure widths below the nominal resolution of the optical process. An advantage of such a process step would be the self-alignment to the primary structure, which would render a second exposure step unnecessary. Using macroscopic and stochastic modeling approaches, we demonstrate that it may be possible to control the width of the secondary structure created by cross-linking by the amount of quencher base added.

Paper Details

Date Published: 30 March 2010
PDF: 9 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392I (30 March 2010); doi: 10.1117/12.846491
Show Author Affiliations
Jürgen Fuhrmann, Weierstrass-Institute for Applied Analysis and Stochastics (Germany)
André Fiebach, Weierstrass-Institute for Applied Analysis and Stochastics (Germany)
George P. Patsis, Technological Educational Institution of Athens (Greece)


Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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