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Proceedings Paper

Improvement of the process overlay control for sub-40-nm DRAM
Author(s): Sarohan Park; Eun-Ha Lee; Eun-Kyoung Shin; Yoon-Jung Ryu; Hye-Jin Shin; Seung-Hyun Hwang; Hee-Youl Lim; Kyu-Tae Sun; Tae-Seung Eom; Noh-Jung Kwak; Sung-Ki Park
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Paper Abstract

In recent years, DRAM technology node has shrunk below to 40nm HP (Half Pitch) patterning with significant progresses of hyper NA (Numerical Aperture) immersion lithography system and process development. Especially, the development of DPT (Double Patterning Technology) and SPT (Spacer Patterning Technology) can extend the resolution limit of lithography to sub 30nm HP patterning. However it is also necessary to improve the tighter overlay control for developing the sub 40nm DRAM because of small device overlap margin. Since new process technologies such as complex structure of DPT and SPT, new hard mask material and extreme CMP (Chemical Mechanical Planarization) process have also applied as design rule is decreased, the improvement of process overlay control is very important. In this paper, we have studied that the characterization of overlay performance for sub 40nm DRAM with actual experimental data. First, we have investigated the influence on the intra field overlay and inter field overlay with comparison of HOWA and HOPC and the improvement of inter field overlay residual errors. Then we have studied the process effects such as hard mask material, thermal process and CMP process that affect to overlay control.

Paper Details

Date Published: 2 April 2010
PDF: 8 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76382H (2 April 2010); doi: 10.1117/12.846489
Show Author Affiliations
Sarohan Park, Hynix Semiconductor Inc. (Korea, Republic of)
Eun-Ha Lee, Hynix Semiconductor Inc. (Korea, Republic of)
Eun-Kyoung Shin, Hynix Semiconductor Inc. (Korea, Republic of)
Yoon-Jung Ryu, Hynix Semiconductor Inc. (Korea, Republic of)
Hye-Jin Shin, Hynix Semiconductor Inc. (Korea, Republic of)
Seung-Hyun Hwang, Hynix Semiconductor Inc. (Korea, Republic of)
Hee-Youl Lim, Hynix Semiconductor Inc. (Korea, Republic of)
Kyu-Tae Sun, Hynix Semiconductor Inc. (Korea, Republic of)
Tae-Seung Eom, Hynix Semiconductor Inc. (Korea, Republic of)
Noh-Jung Kwak, Hynix Semiconductor Inc. (Korea, Republic of)
Sung-Ki Park, Hynix Semiconductor Inc. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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