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Proceedings Paper

Latest performance of immersion scanner S620D with the Streamlign platform for the double patterning generation
Author(s): Hirotaka Kohno; Yuichi Shibazaki; Jun Ishikawa; Junichi Kosugi; Yasuhiro Iriuchijima; Masato Hamatani
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Paper Abstract

Currently, it is considered that one of the most favorable options for the 32 nm HP node is pitch-splitting double patterning, which requires the lithography tool to achieve high productivity and high overlay accuracy simultaneously. In the previous work [1], we described the concepts and the technical features of Nikon's immersion scanner based on our newly developed platform, Streamlign, designed for 2nm overlay, 200wph throughput, and short setup time. In this paper, we present the latest actual performance of S620D with the Streamlign platform. Owing to the high repeatability of our new encoder metrology system, Bird's Eye Control, and Stream Alignment, S620D achieves less than 2 nm overlay accuracy, less than 15nm focus accuracy, and successful 32 and 22 nm L/S pitchsplitting double patterning exposures. Furthermore, the results at high scanning speed up to 700 mm/s are fine and we have successfully demonstrated over 4,000 wpd throughput, which confirms the potential for high productivity. Nikon has developed this Streamlign as an optimized long life platform based on the upgradable Modular2 structure for upcoming generations. The performance of S620D indicates the possibility of immersion extension down through the 22 nm HP node and beyond.

Paper Details

Date Published: 10 March 2010
PDF: 12 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401O (10 March 2010); doi: 10.1117/12.846485
Show Author Affiliations
Hirotaka Kohno, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)
Jun Ishikawa, Nikon Corp. (Japan)
Junichi Kosugi, Nikon Corp. (Japan)
Yasuhiro Iriuchijima, Nikon Corp. (Japan)
Masato Hamatani, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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