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Proceedings Paper

Pattern deformation caused by deformed pellicle with ArF exposure
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Paper Abstract

It will directly affects pellicle degradation, at the irradiated part of the pellicle, and make a sloped pellicle surface and will act like a prism before change of phase or transmittance occurs, because the energies of C, F and O single bondings composing the ArF pellicle film is quite smaller than the energy of 193 nm ArF. Thus, outgoing light has information of smaller space than mask size. In order to offer some tip to find the appearance of pellicle thinning caused defect, several types of pattern deformation caused by pellicle degradation is studied.

Paper Details

Date Published: 3 March 2010
PDF: 7 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76402E (3 March 2010); doi: 10.1117/12.846483
Show Author Affiliations
Jee-Hye You, Hanyang Univ. (Korea, Republic of)
Ilsin An, Nano-View Co. (Korea, Republic of)
Hye-Keun Oh, Hanyang Univ. (Korea, Republic of)

Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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