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Proceedings Paper

Illumination optics for source-mask optimization
Author(s): Yasushi Mizuno; Tomoyuki Matsuyama; Soichi Owa; Osamu Tanitsu; Naonori Kita; Masahiko Okumura
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Paper Abstract

Source Mask Optimization (SMO) 1 is proposed and being developed for the 32 nm generation and beyond in order to extend dose / focus margin by simultaneous optimization of the illuminator source shape and a customized mask. For several years now, mask optimization techniques have been improving. At the same time, the flexibility of the illuminator must also be improved, leading to more complex illumination shapes. As a result, pupil fill is moving from a parametric model defined by sigma value, ratio, clocking angle, subtended angle and/or, pole balance, to a freeform condition with gray scale defined by light intensity in the illuminator. We have evaluated an intelligent illuminator in order to meet requirements of SMO. Then we have confirmed controllability of the pupilgram.

Paper Details

Date Published: 10 March 2010
PDF: 7 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401I (10 March 2010); doi: 10.1117/12.846476
Show Author Affiliations
Yasushi Mizuno, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Soichi Owa, Nikon Corp. (Japan)
Osamu Tanitsu, Nikon Corp. (Japan)
Naonori Kita, Nikon Corp. (Japan)
Masahiko Okumura, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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