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Proceedings Paper

SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance
Author(s): Seiji Nagahara; Kazuyuki Yoshimochi; Hiroshi Yamazaki; Kazuhiro Takeda; Takayuki Uchiyama; Stephen Hsu; Zhipan Li; Hua-yu Liu; Keith Gronlund; Terunobu Kurosawa; Jun Ye; Luoqi Chen; Hong Chen; Zheng Li; Xiaofeng Liu; Wei Liu
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Paper Abstract

This paper investigates the application of source-mask optimization (SMO) techniques for 28 nm logic device and beyond. We systematically study the impact of source and mask complexity on lithography performance. For the source, we compare SMO results for the new programmable illuminator (ASML's FlexRay) and standard diffractive optical elements (DOEs). For the mask, we compare different mask-complexity SMO results by enforcing the sub-resolution assist feature (SRAF or scattering bar) configuration to be either rectangular or freeform style while varying the mask manufacturing rule check (MRC) criteria. As a lithography performance metric, we evaluate the process windows and MEEF with different source and mask complexity through different k1 values. Mask manufacturability and mask writing time are also examined. With the results, the cost effective approaches for logic device production are shown, based on the balance between lithography performance and source/mask (OPC/SRAF) complexity.

Paper Details

Date Published: 13 March 2010
PDF: 12 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401H (13 March 2010); doi: 10.1117/12.846473
Show Author Affiliations
Seiji Nagahara, NEC Electronics Corp. (Japan)
Kazuyuki Yoshimochi, NEC Electronics Corp. (Japan)
Hiroshi Yamazaki, NEC Electronics Corp. (Japan)
Kazuhiro Takeda, NEC Electronics Corp. (Japan)
Takayuki Uchiyama, NEC Electronics Corp. (Japan)
Stephen Hsu, ASML Brion Technologies, Inc. (United States)
Zhipan Li, ASML Brion Technologies, Inc. (United States)
Hua-yu Liu, ASML Brion Technologies, Inc. (United States)
Keith Gronlund, ASML Brion Technologies, Inc. (United States)
Terunobu Kurosawa, ASML Brion Technologies, Inc. (United States)
Jun Ye, ASML Brion Technologies, Inc. (United States)
Luoqi Chen, ASML Brion Technologies, Inc. (United States)
Hong Chen, ASML Brion Technologies, Inc. (United States)
Zheng Li, ASML Brion Technologies, Inc. (United States)
Xiaofeng Liu, ASML Brion Technologies, Inc. (United States)
Wei Liu, ASML Brion Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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