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Proceedings Paper

Influence of error distribution shape on process capability analysis
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Paper Abstract

In semiconductor manufacturing, process errors are likely to depart from normal distributions. For data violating the assumption of normality, classical process capability indices (PCIs) may be misleading in terms of the process behavior. To avoid this, we propose new PCIs with information on the skewness and the kurtosis of a given distribution. Based on a Monte Carlo simulation with various distributions, the formulae of the proposed PCIs were optimized. Compared with Johnson transformation or other approaches, our proposed method is simple in calculation. Therefore, it would have greater applicability for data analysis in semiconductor manufacturing.

Paper Details

Date Published: 1 April 2010
PDF: 7 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 763827 (1 April 2010); doi: 10.1117/12.846471
Show Author Affiliations
Masafumi Asano, Toshiba Corp. (Japan)
Takahiro Ikeda, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

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