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Proceedings Paper

Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system
Author(s): Akio Yamada; Yoshihisa Oae; Tatsuro Okawa; Masahiro Takizawa; Masaki Yamabe
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Paper Abstract

In the Mask D2I project at ASET, the authors evaluated an e-beam multi column cell exposure system with character projection to expose photomask patterns of hp65nm and hp45nm devices. They prepared more than 2,000 characters in a deflection area of a character projection mask extracted from the hp65nm pattern. The character projection in the multi column cell system could expose patterns equivalent to those by the conventional variable shaped beams. In a typical pattern layout of photomasks for hp45nm devices, the four column cell system required an exposure time of about 1/3 of the time required by a single column system. The character projection can reduce the exposure time corresponding to the reduction of shot counts.

Paper Details

Date Published: 10 March 2010
PDF: 8 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370C (10 March 2010); doi: 10.1117/12.846464
Show Author Affiliations
Akio Yamada, Association of Super-Advanced Electronics Technologies (Japan)
Yoshihisa Oae, Association of Super-Advanced Electronics Technologies (Japan)
Tatsuro Okawa, Association of Super-Advanced Electronics Technologies (Japan)
Masahiro Takizawa, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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