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Proceedings Paper

Topography-aware BARC optimization for double patterning
Author(s): Shijie Liu; Tim Fühner; Feng Shao; Aliaksandr Barenbaum; Johannes Jahn; Andreas Erdmann
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Paper Abstract

This paper aims at identifying appropriate bottom anti-reflective coatings (BARCs) for double patterning techniques such as Litho-Freeze-Litho-Etch (LFLE). A short introduction into the employed optimization methodology, including variables, figures of merit, models and optimization algorithms is given. A study on the impact of a refractive index modulation caused by the first lithographic step is presented. Several optimization surveys taking the index modulation into account are set forth, and the results are discussed. In addition to optimization procedures aiming at optimizing one litho step at a time, a co-optimization study for both litho steps is proposed. Finally, two multi-objective optimization procedures that allow for a post-optimization exploration and selection of optimum solutions are presented. Numerous solutions are discussed in terms of their anti-reflectance behavior and their manufacturing feasibility.

Paper Details

Date Published: 10 March 2010
PDF: 12 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76403C (10 March 2010); doi: 10.1117/12.846441
Show Author Affiliations
Shijie Liu, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Tim Fühner, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Feng Shao, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Aliaksandr Barenbaum, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Univ. of Erlangen-Nuremberg (Germany)
Johannes Jahn, Univ. of Erlangen-Nuremberg (Germany)
Andreas Erdmann, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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