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Proceedings Paper

Planarizing material for reverse-tone step and flash imprint lithography
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Paper Abstract

Reverse-tone Step and Flash Imprint Lithography (S-FIL/R) requires materials that can be spin coated onto patterned substrates with significant topography and that are highly-planarizing. Ideally, these planarizing materials must contain silicon for etch selectivity, be UV or thermally curable, have low viscosity, and low volatility. One such novel material in particular, a branched and functionalized siloxane (Si-12), is able to adequately satisfy the above requirements. This paper describes a study of the properties of epoxy functionalized Si-12 (epoxy-Si-12) as a planarizing layer. An efficient synthetic route to epoxy-Si-12 was successfully developed, which is suitable and scalable for an industrial process. Epoxy-Si-12 has a high silicon content (30.0 %), low viscosity (29 cP @ 25 °C), and low vapor pressure (0.65 Torr @ 25 °C). A planarizing study was carried out using epoxy-Si-12 on trench patterned test substrates. The material showed excellent planarizing properties and met the calculated critical degree of planarization (critical DOP), which is a requirement for a successful etch process. An S-FIL/R process using epoxy-Si-12 was demonstrated using, an ImprioR 100 (Molecular Imprints Inc., USA) imprint tool. The results indicate that epoxy-Si-12 works very well as a planarizing layer for S-FIL/R.

Paper Details

Date Published: 2 April 2010
PDF: 11 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 763708 (2 April 2010); doi: 10.1117/12.846430
Show Author Affiliations
Tsuyoshi Ogawa, The Univ. of Texas at Austin (United States)
Satoshi Takei, Nissan Chemical Industries, Ltd. (Japan)
B. Michael Jacobsson, The Univ. of Texas at Austin (United States)
Ryan Deschner, The Univ. of Texas at Austin (United States)
William Bell, The Univ. of Texas at Austin (United States)
Michael W. Lin, The Univ. of Texas at Austin (United States)
Yuji Hagiwara, The Univ. of Texas at Austin (United States)
Makoto Hanabata, Nissan Chemical Industries, Ltd. (Japan)
C. Grant Willson, The Univ. of Texas at Austin (United States)

Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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