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Proceedings Paper

Point-of-use filtration methods to reduce defectivity
Author(s): Jennifer Braggin; Wim Schoallert; Kenji Hoshiko; Xavier Buch
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Paper Abstract

While immersion lithography has been rapidly implemented in manufacturing environments around the world, a few defect challenges still remain. Bubble and watermark defects are well understood and have been addressed by equipment manufacturers. However, a few defects still bewilder the lithography community, including residues and microbridging. These defects are difficult to completely eliminate as they may have many root causes. However, through effective point-of-use filtration, they can be greatly reduced. Point-of-use filtration has traditionally focused on selecting a filter membrane at a specific pore size that is compatible with the resist chemistry being utilized in the process. The research hereby discussed indicates that in addition to these important point-of-use filter choices, careful filtration parameter setup can improve defectivity results and impact the coating process.

Paper Details

Date Published: 29 March 2010
PDF: 9 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763918 (29 March 2010); doi: 10.1117/12.846346
Show Author Affiliations
Jennifer Braggin, Entegris, Inc. (United States)
Wim Schoallert, JSR Micro N.V. (Belgium)
Kenji Hoshiko, JSR Micro N.V. (Belgium)
Xavier Buch, JSR Micro N.V. (Belgium)


Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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