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Proceedings Paper

Process feasibility investigation of freezing free litho-litho-etch process for below 32nm hp
Author(s): Tsuyoshi Nakamura; Masaru Takeshita; Jiro Yokoya; Yasuhiro Yoshii; Hirokuni Saito; Ryoichi Takasu; Katsumi Ohmori
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Paper Abstract

Double patterning with 193nm immersion lithography becomes to most promising candidate for 32nm half pitch node and possibly below 32nm half pitch. Several double patterning methods have been suggested such as LELE (Litho-Etch -Litho-Etch), LLE (Litho-Litho-Etch) and Spacer defined process, however, LLE process is pointed out as low cost double patterning technique because of its simplicity. But LLE process needs new method to maintain 1st lithography pattern and additional freezing processes have been suggested In SPIE Advanced Lithography 2009, freezing free "Posi/Posi" process was introduced as candidate for LLE process. This is LLE process that uses two different positive tone photoresists without freezing process. The resist for 2nd lithography contains a specific solvent to prevent the mixing of two resists and there is an activation energy gap between 1st and 2nd resists to maintain 1st lithography pattern. The double patterning can be successfully processed by these specific resists without freezing process. In this study, the performance of this freezing free "Posi/Posi" process is investigated for pitch splitting pattern using 1.35 NA exposure tool. The imaging results including CD control capability, and etching results are collected for 32nm half pitch and below. Additionally the two-dimensional pattern imaging is also obtained for 76nm minimum pitch.

Paper Details

Date Published: 25 March 2010
PDF: 8 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392V (25 March 2010); doi: 10.1117/12.846335
Show Author Affiliations
Tsuyoshi Nakamura, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Masaru Takeshita, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Jiro Yokoya, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Yasuhiro Yoshii, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Hirokuni Saito, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Ryoichi Takasu, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Katsumi Ohmori, Tokyo Ohka Kogyo Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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