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Proceedings Paper

Development of a design intent extraction flow for mask manufacturing
Author(s): Kokoro Kato; Masakazu Endo; Tadao Inoue; Masaki Yamabe
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Paper Abstract

The cost of photomasks has been rising year by year as the process node gets finer and the mask cost is becoming one of the headaches in the semiconductor industry. For the purpose of the mask cost reduction, ASET started Mask D2I (Mask Design, Drawing and Inspection Technology) project in 2006. In earlier papers[1-4], we introduced the idea of photomask data prioritization method which is referred to as Mask Data Rank (MDR). We have built our software system to convert Design Intent (DI) to MDR with cooperation of STARC. Then we showed the results of preliminary experiments with mask data provided by STARC. In this paper we explain the software mechanism of design intent extraction flow. Then we show the experimental results with actual chip data in three semiconductor companies and address the related issues. Finally we introduce a new idea to extract design intent from analog circuits.

Paper Details

Date Published: 2 April 2010
PDF: 8 pages
Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 76410K (2 April 2010); doi: 10.1117/12.846334
Show Author Affiliations
Kokoro Kato, Association of Super-Advanced Electronics Technologies (Japan)
Masakazu Endo, Association of Super-Advanced Electronics Technologies (Japan)
Tadao Inoue, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7641:
Design for Manufacturability through Design-Process Integration IV
Michael L. Rieger; Joerg Thiele, Editor(s)

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