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Proceedings Paper

Experimental result of polarization characteristics separation method
Author(s): Toru Fujii; Kosuke Suzuki; Jun Kogo; Kiyoshi Toyama; Kunihisa Sasada; Masayasu Sawada
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Paper Abstract

The use of high lens numerical aperture for improving the resolution of a lithographic lens requires a high incident angle of exposure light in resist, which induces vectorial effects. As a result, high NA lithography has become more sensitive to vectorial effects, and a vectorial fingerprint with higher accuracy has become necessary for effective image forming simulation. We successfully obtained true polarization characteristics of single optics by separating the effect of measurement optics, arranged serially, in the measurement optical path. Accuracy of the separated polarization characteristics of two test birefringent optics on a testbench for principle verification was calculated to be better than 0.01 nm of OPE simulation error.

Paper Details

Date Published: 3 March 2010
PDF: 8 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76400R (3 March 2010); doi: 10.1117/12.846323
Show Author Affiliations
Toru Fujii, Nikon Corp. (Japan)
Kosuke Suzuki, Nikon Corp. (Japan)
Jun Kogo, Nikon Corp. (Japan)
Kiyoshi Toyama, Nikon Corp. (Japan)
Kunihisa Sasada, Nikon Corp. (Japan)
Masayasu Sawada, Nikon Systems Inc. (Japan)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

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