Share Email Print

Proceedings Paper

Improved recipe quality control: from development to mass production
Author(s): Yukari Nakata; Shunsuke Koshihara; Hiroki Kawada; Kyoungmo Yang; Junichi Kakuta; Akemi Kono
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The Critical Dimension Scanning Electron Microscope (CD-SEM) performs automatic measurement according to the recipe conditions programmed in advance. Traditionally, recipe creation requires not only a knowledgeable engineer but also scheduled tool time with appropriate wafers from the production equipment. It will bring a negative impact significantly to overall productivity when CD-SEM is under heavy utilization for creating massive recipe. Besides, the errors from recipe caused could give an additional interruption for production running from assisting measurement and recipe optimization as well. In this paper, we introduce the new concept of a function, naming Average Template, toward improving offline based recipe correction. Average Template allows creating highly robust pattern recognition template against pattern variations as averaging the images which are saved during recipe running, and this new function has been evaluated to prove the benefit of its application in the mass production. DesignGauge (DG) has allowed reliable recipe creation. However, the functionality improvement for stable recipe optimization is effectuated without wafer through the Average Template. Both recipe creation and optimization in robustness are actualized as utilizing this new function in DG, so that tool can keep under production without any interruption.

Paper Details

Date Published: 1 April 2010
PDF: 12 pages
Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76382S (1 April 2010); doi: 10.1117/12.846320
Show Author Affiliations
Yukari Nakata, Hitachi High-Technologies Corp. (Japan)
Shunsuke Koshihara, Hitachi High-Technologies Corp. (Japan)
Hiroki Kawada, Hitachi High-Technologies Corp. (Japan)
Kyoungmo Yang, Hitachi High-Technologies Corp. (Japan)
Junichi Kakuta, Hitachi High-Technologies Corp. (Japan)
Akemi Kono, Hitachi High-Technologies Corp. (Japan)

Published in SPIE Proceedings Vol. 7638:
Metrology, Inspection, and Process Control for Microlithography XXIV
Christopher J. Raymond, Editor(s)

© SPIE. Terms of Use
Back to Top