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Proceedings Paper

Evaluations of EUV resist outgassing by gas chromatography mass spectrometry (GC-MS)
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Paper Abstract

This paper summarizes the investigation of the evaluation methods of EUV resist outgassing based on pressure-rise, gas chromatography mass spectrometry (GC-MS) and quadrupole mass spectrometry (QMS). We discuss the merit and demerit about these three methods and propose an optimal employment of each evaluation method. In addition, detail results of resist outgassing evaluated from GC-MS were reported.

Paper Details

Date Published: 22 March 2010
PDF: 8 pages
Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362W (22 March 2010); doi: 10.1117/12.846269
Show Author Affiliations
Hiroaki Oizumi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Kazuyuki Matsumaro, Semiconductor Leading Edge Technologies, Inc. (Japan)
Julius Santillan, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 7636:
Extreme Ultraviolet (EUV) Lithography
Bruno M. La Fontaine, Editor(s)

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