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Proceedings Paper

Monitor and self-diagnostic technology for mask e-beam writing system
Author(s): N. Samoto; H. Manabe; O. Wakimoto; S. Iida; H. Hoshi; M. Yamabe
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Paper Abstract

The accuracy of image placement and linewidth on masks has become very crucial to the point that even minor variations in exposure parameters require re-works and result in increasing mask cost. In 2006, at the Association of Super-Advanced Electronics Technologies (ASET), Mask Design, Drawing and Inspection technology Research Department (Mask D2I) had launched a 4-year development program for the optimization of mask design, drawing, and inspection to reduce photomask manufacturing cost. An outline of a system to monitor and self-diagnose the process of data transfer, magnetic field change, and vibration during exposure is described here.

Paper Details

Date Published: 2 April 2010
PDF: 8 pages
Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371K (2 April 2010); doi: 10.1117/12.846266
Show Author Affiliations
N. Samoto, Association of Super-Advanced Electronics Technologies (Japan)
H. Manabe, Association of Super-Advanced Electronics Technologies (Japan)
O. Wakimoto, Association of Super-Advanced Electronics Technologies (Japan)
S. Iida, Association of Super-Advanced Electronics Technologies (Japan)
H. Hoshi, Association of Super-Advanced Electronics Technologies (Japan)
M. Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7637:
Alternative Lithographic Technologies II
Daniel J. C. Herr, Editor(s)

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