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Proceedings Paper

Non-toric extended depth of focus contact lenses for astigmatism and presbyopia correction
Author(s): Shai Ben Yaish; Alex Zlotnik; Oren Yehezkel; Karen Lahav-Yacouel; Michael Belkin; Zeev Zalevsky
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Paper Abstract

Purpose: Testing whether the extended depth of focus technology embedded on non-toric contact lenses is a suitable treatment for both astigmatism and presbyopia. Methods: The extended depth of focus pattern consisting of microndepth concentric grooves was engraved on a surface of a mono-focal soft contact lens. These grooves create an interference pattern extending the focus from a point to a length of about 1mm providing a 3.00D extension in the depth of focus. The extension in the depth of focus provides high quality focused imaging capabilities from near through intermediate and up to far ranges. Due to the angular symmetry of the engraved pattern the extension in the depth of focus can also resolve regular as well as irregular astigmatism aberrations. Results: The contact lens was tested on a group of 8 astigmatic and 13 subjects with presbyopia. Average correction of 0.70D for astigmatism and 1.50D for presbyopia was demonstrated. Conclusions: The extended depth of focus technology in a non-toric contact lens corrects simultaneously astigmatism and presbyopia. The proposed solution is based upon interference rather than diffraction effects and thus it is characterized by high energetic efficiency to the retina plane as well as reduced chromatic aberrations.

Paper Details

Date Published: 2 March 2010
PDF: 5 pages
Proc. SPIE 7550, Ophthalmic Technologies XX, 75502A (2 March 2010); doi: 10.1117/12.846262
Show Author Affiliations
Shai Ben Yaish, Xceed Imaging Ltd. (Israel)
Alex Zlotnik, Xceed Imaging Ltd. (Israel)
Oren Yehezkel, Xceed Imaging Ltd. (Israel)
Karen Lahav-Yacouel, Xceed Imaging Ltd. (Israel)
Michael Belkin, Goldshleger Eye Research Institute, Tel Aviv Univ. (United States)
Zeev Zalevsky, Bar-Ilan Univ. (Israel)


Published in SPIE Proceedings Vol. 7550:
Ophthalmic Technologies XX
Fabrice Manns; Per G. Söderberg; Arthur Ho, Editor(s)

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