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Proceedings Paper

Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system
Author(s): Shinji Tarutani; Hideaki Tsubaki; Hidenori Takahashi; Takayuki Itou; Kentaro Matsunaga; Gousuke Shiraishi; Toshiro Itani
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Paper Abstract

Fundamental studies on polymer bounded PAG and polymer - PAG blend type were carried out with the viewpoint of dissolution property, lithographic performance, and blur. These materials were prepared to be able to directly compare and to discuss the difference between blend and bounded PAG, with different PAG loading amount. Dissolution property revealed the clear difference of these materials tendency to the PAG loading amount variation. Lithographic performance difference corresponds to the dissolution property difference, and there found the strategy to improve lithographic performance with polymer bounded PAG type resist. Blur study suggests the advantage in polymer bounded PAG in resolution.

Paper Details

Date Published: 30 March 2010
PDF: 7 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391O (30 March 2010); doi: 10.1117/12.846033
Show Author Affiliations
Shinji Tarutani, FUJIFILM Corp. (Japan)
Hideaki Tsubaki, FUJIFILM Corp. (Japan)
Hidenori Takahashi, FUJIFILM Corp. (Japan)
Takayuki Itou, FUJIFILM Corp. (Japan)
Kentaro Matsunaga, Semiconductor Leading Edge Technologies, Inc. (Japan)
Gousuke Shiraishi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)

Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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