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Proceedings Paper

Study on approaches for improvement of EUV-resist sensitivity
Author(s): Shinji Tarutani; Hideaki Tsubaki; Hidenori Takahashi; Takayuki Itou
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Paper Abstract

Several methods to improve sensitivity of EUV resist, with a couple of key points of acid generation efficiency and deprotection reaction efficiency. Larger loading of PAG to increase the secondary electron absorption possibility, cation unit design to lower the lowest unoccupied molecular orbital of cation, and lowering ionization potential of polymer to enable efficient secondary electron generation, were discussed in the viewpoint of acid generation efficiency. Larger size of anion structure design on PAG was applied to special formulation of small loading of quencher to minimize necessary generated acid concentration to give enough de-protection reaction amount, and to higher PEB temperature resist process to maximize de-protection reaction efficiency.

Paper Details

Date Published: 29 March 2010
PDF: 8 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763909 (29 March 2010); doi: 10.1117/12.846031
Show Author Affiliations
Shinji Tarutani, FUJIFILM Corp. (Japan)
Hideaki Tsubaki, FUJIFILM Corp. (Japan)
Hidenori Takahashi, FUJIFILM Corp. (Japan)
Takayuki Itou, FUJIFILM Corp. (Japan)

Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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