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Proceedings Paper

Polymer photochemistry at the EUV wavelength
Author(s): Theodore H. Fedynyshyn; Russell B. Goodman; Alberto Cabral; Charles Tarrio; Thomas B. Lucatorto
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Paper Abstract

The higher energy associated with extreme ultraviolet (EUV) radiation coupled with the high absorptivity of most organic polymers at these wavelengths should lead to increased excited state population and higher quantum yields of photoproducts. Polymers representative of those commonly employed in resists as well as some model polymers were selected for this study. Polymer photochemistry at EUV was catalogued as to the effect of absorbed 13.4-nm radiation on a polymer's quantum yield of chain scission (Φs) and crosslinking (Φx). In selected cases, the chain scission and crosslinking quantum yields were also compared to those previously determined at 157-, 193- and 248-nm. It was found that quantum yield values were over a magnitude greater at EUV relative to optical wavelengths.

Paper Details

Date Published: 26 March 2010
PDF: 12 pages
Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76390A (26 March 2010); doi: 10.1117/12.845997
Show Author Affiliations
Theodore H. Fedynyshyn, Massachusetts Institute of Technology (United States)
Russell B. Goodman, Massachusetts Institute of Technology (United States)
Alberto Cabral, Massachusetts Institute of Technology (United States)
Charles Tarrio, National Institute of Standards and Technology (United States)
Thomas B. Lucatorto, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 7639:
Advances in Resist Materials and Processing Technology XXVII
Robert D. Allen, Editor(s)

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