Share Email Print
cover

Proceedings Paper

Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems
Author(s): Melchior Mulder; André Engelen; Oscar Noordman; Gert Streutker; Bert van Drieenhuizen; Cas van Nuenen; Wilfred Endendijk; Jef Verbeeck; Wim Bouman; Anita Bouma; Robert Kazinczi; Robert Socha; Dirk Jürgens; Joerg Zimmermann; Bastian Trauter; Joost Bekaert; Bart Laenens; Daniel Corliss; Greg McIntyre
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

This paper describes the principle and performance of FlexRay, a fully programmable illuminator for high NA immersion systems. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical elements and changing lens positions. On demand (freeform) source availability allows for reduction in R&D cycle time and shrink in k1. Unlimited tuning allows for better machine to machine matching. FlexRay has been integrated in a 1.35NA TWINSCAN exposure system. We will present data of FlexRay using measured traditional and freeform illumination sources. In addition system performance qualification data on stability, reproducibility and imaging will be shown. The benefit of FlexRay for SMO enabling shrink is demonstrated using an SRAM example.

Paper Details

Date Published: 4 March 2010
PDF: 10 pages
Proc. SPIE 7640, Optical Microlithography XXIII, 76401P (4 March 2010); doi: 10.1117/12.845984
Show Author Affiliations
Melchior Mulder, ASML (Netherlands)
André Engelen, ASML (Netherlands)
Oscar Noordman, ASML (Netherlands)
Gert Streutker, ASML (Netherlands)
Bert van Drieenhuizen, ASML (Netherlands)
Cas van Nuenen, ASML (Netherlands)
Wilfred Endendijk, ASML (Netherlands)
Jef Verbeeck, ASML (Netherlands)
Wim Bouman, ASML (Netherlands)
Anita Bouma, ASML (Netherlands)
Robert Kazinczi, ASML (Netherlands)
Robert Socha, ASML Brion Technologies Inc. (United States)
Dirk Jürgens, Carl Zeiss SMT AG (Germany)
Joerg Zimmermann, Carl Zeiss SMT AG (Germany)
Bastian Trauter, Carl Zeiss SMT AG (Germany)
Joost Bekaert, IMEC vzw (Belgium)
Bart Laenens, IMEC vzw (Belgium)
Daniel Corliss, IBM Microelectronics (United States)
Greg McIntyre, IBM Microelectronics (United States)


Published in SPIE Proceedings Vol. 7640:
Optical Microlithography XXIII
Mircea V. Dusa; Will Conley, Editor(s)

© SPIE. Terms of Use
Back to Top