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Proceedings Paper

Two-color photo-initiation/inhibition lithography
Author(s): Robert R. McLeod; Benjamin A. Kowalski; Michael C. Cole
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Paper Abstract

Traditional photolithography begins with single-photon absorption of patterned light by a photo-initiator to locally expose a resist. In two-color photo-initiation/inhibition (2PII) lithography, these exposed regions are confined by a surrounding pattern of inhibitors generated by one-photon absorption of a second color in a photo-inhibitor. Like a stencil used to confine spray-paint to a thin, sharp line, the inhibitory pattern acts as a remotely programmable, transient near-field mask to control the size and shape of the modified resist region. The inhibiting species rapidly recombine in the dark, allowing for fast sequential exposures and thus enabling fabrication of complex two- or threedimensional structures.

Paper Details

Date Published: 16 February 2010
PDF: 8 pages
Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 759102 (16 February 2010); doi: 10.1117/12.845850
Show Author Affiliations
Robert R. McLeod, Univ. of Colorado at Boulder (United States)
Benjamin A. Kowalski, Univ. of Colorado at Boulder (United States)
Michael C. Cole, InPhase Technologies (United States)


Published in SPIE Proceedings Vol. 7591:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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