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Proceedings Paper

Optical emission spectroscopy study of premixed C2H4/O2 and C2H4/C2H2/O2 flames for diamond growth with and without CO2 laser excitation
Author(s): X. N. He; T. Gebre; X. K. Shen; Z. Q. Xie; Y. S. Zhou; Y. F. Lu
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Paper Abstract

Optical emission spectroscopy (OES) measurements were carried out to study premixed C2H4/O2 and C2H4/C2H2/O2 combustion flame for diamond deposition with and without a CO2 laser excitation. Strong emissions from radicals C2 and CH were observed in the visible range in all the OES spectra acquired. By adding a continuous-wave CO2 laser to irradiate the flame at a wavelength of 10.591 μm, the common CO2 laser wavelength, it was discovered that the emission intensities of the C2 and CH radicals were increased due to the laser beam induced excitation. OES measurements of the C2 and CH radicals were performed using different gas combinations and laser powers. The rotational temperatures in the flame were determined by analyzing the spectra of the R-branch of the A2Δ→X2Π (0, 0) electronic transition near 430 nm (CH band head). Information obtained from the OES spectra, including the emission intensities of the C2 and CH radicals, the intensity ratios, and the rotational temperatures, was integrated into the study of diamond deposition on tungsten carbide substrates for mechanism analysis of the laser induced vibrational excitation and laser-assisted diamond deposition.

Paper Details

Date Published: 23 February 2010
PDF: 10 pages
Proc. SPIE 7585, Laser-based Micro- and Nanopackaging and Assembly IV, 75850A (23 February 2010); doi: 10.1117/12.843933
Show Author Affiliations
X. N. He, Univ. of Nebraska-Lincoln (United States)
T. Gebre, Univ. of Nebraska-Lincoln (United States)
X. K. Shen, Univ. of Nebraska-Lincoln (United States)
Z. Q. Xie, Univ. of Nebraska-Lincoln (United States)
Y. S. Zhou, Univ. of Nebraska-Lincoln (United States)
Y. F. Lu, Univ. of Nebraska-Lincoln (United States)


Published in SPIE Proceedings Vol. 7585:
Laser-based Micro- and Nanopackaging and Assembly IV
Wilhelm Pfleging; Yongfeng Lu; Kunihiko Washio; Jun Amako; Willem Hoving, Editor(s)

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