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Proceedings Paper

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods
Author(s): Linyong Pang; Peter Hu; Danping Peng; Dongxue Chen; Tom Cecil; Lin He; Guangming Xiao; Vikram Tolani; Thuc Dam; Ki-Ho Baik; Bob Gleason
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Paper Abstract

For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents a great challenge, because it is fundamentally constrained by basic principles of optical physics. For years, source optimization and mask pattern correction have been conducted as two separate RET steps. For source optimization, the source was optimized based on fixed mask patterns; in other words, OPC and SRAFs were not considered during source optimization. Recently, some new approaches to Source Mask Optimization (SMO) have been introduced for the lithography development stage. The next important step would be the extension of SMO, and in particular the mask optimization in SMO, into full chip. In this paper, a computational framework based on Level Set Method is presented that enables simultaneous source and mask optimization (using Inverse Lithography Technology, or ILT), and can extend the SMO from single clip, to multiple clips, all the way to full chip. Memory and logic device results at the 32nm node and below are presented which demonstrate the benefits of this level-set-method-based SMO and its extendibility to full chip designs.

Paper Details

Date Published: 12 December 2009
PDF: 17 pages
Proc. SPIE 7520, Lithography Asia 2009, 75200X (12 December 2009); doi: 10.1117/12.843578
Show Author Affiliations
Linyong Pang, Luminescent Technologies, Inc. (United States)
Peter Hu, Luminescent Technologies, Inc. (United States)
Danping Peng, Luminescent Technologies, Inc. (United States)
Dongxue Chen, Luminescent Technologies, Inc. (United States)
Tom Cecil, Luminescent Technologies, Inc. (United States)
Lin He, Luminescent Technologies, Inc. (United States)
Guangming Xiao, Luminescent Technologies, Inc. (United States)
Vikram Tolani, Luminescent Technologies, Inc. (United States)
Thuc Dam, Luminescent Technologies, Inc. (United States)
Ki-Ho Baik, Luminescent Technologies, Inc. (United States)
Bob Gleason, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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