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Proceedings Paper

Periodical polymer grating structure with high aspect ratio
Author(s): Jau-Kun Kuo; Wen-Chung Chang; Kao-Feng Yarn; Wei-Ching Chuang
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Paper Abstract

A new procedure for fabricating a periodic structure on a UV polymer at submicron range using holographic interferometry and molding processes is described. First, holographic interference using a He-Cd (325 nm) laser was used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 200 nm nickel thin film was then sputtered onto the positive photoresist. Final line pattern on a UV polymer was formed from casting against the master mold. Initial results show the technique can accurately control the grating's period and depth. A high aspect ratio of grating period (gp) to depth (d) is about 1.35.

Paper Details

Date Published: 26 October 2009
PDF: 6 pages
Proc. SPIE 7516, Photonics and Optoelectronics Meetings (POEM) 2009: Optoelectronic Devices and Integration, 75160J (26 October 2009); doi: 10.1117/12.843466
Show Author Affiliations
Jau-Kun Kuo, Southern Taiwan Univ. of Technology (Taiwan)
Wen-Chung Chang, Southern Taiwan Univ. of Technology (Taiwan)
Kao-Feng Yarn, Far East Univ. (Taiwan)
Wei-Ching Chuang, National Formosa Univ. (Taiwan)

Published in SPIE Proceedings Vol. 7516:
Photonics and Optoelectronics Meetings (POEM) 2009: Optoelectronic Devices and Integration
Zishen Zhao; Ray T. Chen; Yong Chen; Jinzhong Yu; Junqiang Sun; Weiwei Dong, Editor(s)

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