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Proceedings Paper

Inductively coupled plasma etching of SOI and its applications in submicron optical waveguide devices
Author(s): Zhongchao Fan; Weihua Han; Fuhua Yang; Xuejun Xu; Qingzhong Huang; Xi Xiao; Yu Zhu; Yuntao Li; Zhiyong Li; Yude Yu; Jinzhong Yu
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Paper Abstract

SOI promises a good platform for dense integration of optical devices. However, as dimensions scale down, propagation losses mainly caused by the scattering loss at sidewall had been serious problems. ICP etching of SOI is proved to be an available anisotropic etch technique to make submicron optical waveguide devices. With the help of e-beam lithography, We fabricated Single-mode submicron rib SOI waveguide with propagation loss as low as 1.2 dB/mm. Examples of SOI optical waveguide devices are also presented, such as sharp bends and ring resonators with a quality factor larger than 50,000.

Paper Details

Date Published: 26 October 2009
PDF: 5 pages
Proc. SPIE 7516, Photonics and Optoelectronics Meetings (POEM) 2009: Optoelectronic Devices and Integration, 75160B (26 October 2009); doi: 10.1117/12.843461
Show Author Affiliations
Zhongchao Fan, Institute of Semiconductors (China)
Weihua Han, Institute of Semiconductors (China)
Fuhua Yang, Institute of Semiconductors (China)
Xuejun Xu, Institute of Semiconductors (China)
Qingzhong Huang, Institute of Semiconductors (China)
Xi Xiao, Institute of Semiconductors (China)
Yu Zhu, Institute of Semiconductors (China)
Yuntao Li, Institute of Semiconductors (China)
Zhiyong Li, Institute of Semiconductors (China)
Yude Yu, Institute of Semiconductors (China)
Jinzhong Yu, Institute of Semiconductors (China)

Published in SPIE Proceedings Vol. 7516:
Photonics and Optoelectronics Meetings (POEM) 2009: Optoelectronic Devices and Integration
Zishen Zhao; Ray T. Chen; Yong Chen; Jinzhong Yu; Junqiang Sun; Weiwei Dong, Editor(s)

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