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Proceedings Paper

The exploration of laser ablation combined with chemical flow etching
Author(s): Genfu Yuan; Yansheng Yao; Yuping Ma; Xuehui Chen; Huaqi Liang; Shaofeng Zhu
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Paper Abstract

A novel approach Laser Ablation Combined with Chemical Flow Etching is proposed. How laser pluses energy density, repetition rate, pulse width, scan velocity and other parameters cause the eclipsed quantity and the surface quality by combining etching method on metal materials is studied by using experiments. Moreover the effects of corrosive style, its concentration and rushing velocity and other flow parameters are also analyzed in combining process. Experimental results show that the new approach is inspiring in enhancing surface quality and machining velocity. It is obvious that the liquid is the important factor of reducing lags and roughness, also of increasing eclipsing quantity.

Paper Details

Date Published: 21 October 2009
PDF: 6 pages
Proc. SPIE 7515, Photonics and Optoelectronics Meetings (POEM) 2009: Industry Lasers and Applications, 75150R (21 October 2009); doi: 10.1117/12.842962
Show Author Affiliations
Genfu Yuan, Jiangnan Univ. (China)
Anhui Institute of Architecture and Industry (China)
Yansheng Yao, Anhui Institute of Architecture and Industry (China)
Yuping Ma, Anhui Institute of Architecture and Industry (China)
Xuehui Chen, Anhui Institute of Architecture and Industry (China)
Huaqi Liang, Anhui Institute of Architecture and Industry (China)
Shaofeng Zhu, Anhui Institute of Architecture and Industry (China)


Published in SPIE Proceedings Vol. 7515:
Photonics and Optoelectronics Meetings (POEM) 2009: Industry Lasers and Applications
Dianyuan Fan; Horst Weber; Xiao Zhu; Dongsheng Jiang; Xiaochun Xiao; Weiwei Dong; Desheng Xu, Editor(s)

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