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Proceedings Paper

Antireflection on plastic substrates using ion etching with discontinuous metallic film
Author(s): Yu-Wen Yeh; Sheng-Hui Chen; Cheng-Chung Lee; Shih-Liang Ku; Chao-Chun Huang
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Paper Abstract

When a plastic substrate is under a highlight, the reflected light on the substrate always dazzles the observer. To prevent the effect, anti-reflected (AR) coating is applied. However AR-coating is difficult to be designed with wide wavelength range. In this research, the discontinuous metallic films were fabricated on the plastic substrates to reduce the reflection of the plastic substrates with wide wavelength range. To reduce more reflectance, the discontinuous metallic film can also be applied as the mask of selective ion etching to achieve rough surface. The results show the average reflectance of the AR-coating on the plastic substrates has been decreased 5%. The average transmittance has been increased 3%.

Paper Details

Date Published: 16 February 2010
PDF: 7 pages
Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 759112 (16 February 2010); doi: 10.1117/12.842913
Show Author Affiliations
Yu-Wen Yeh, National Central Univ. (Taiwan)
Sheng-Hui Chen, National Central Univ. (Taiwan)
Cheng-Chung Lee, National Central Univ. (Taiwan)
Shih-Liang Ku, National Central Univ. (Taiwan)
Chung-Shan Institute of Science and Technology (Taiwan)
Chao-Chun Huang, Chung-Shan Institute of Science and Technology (Taiwan)


Published in SPIE Proceedings Vol. 7591:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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