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Proceedings Paper

Design, fabrication, and control of scanning plasmonic probe for near-field photolithographic applications
Author(s): Yu-Yen Huang; Yuyan Wang; Kazunori Hoshino; David Giese; Yujan Shrestha; Xiaojing Zhang
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Paper Abstract

We report the design, fabrication and operation of a scanning plasmonic probe compatible with a fully customized Near-field Scanning Microscope system. The probe is a silicon cantilever with a hollow pyramidal probe tip. A silicon dioxide layer was thermally grown to form the probe. A 100 nm thick aluminum layer was then e-beam evaporated onto the released probe tip to form the metal-dielectric interface for surface plasmonic wave propagation. A 500 nm diameter aperture was subsequently milled with the Focus Ion Beam. The probe was controlled with a built-in scanning controller for the probe-sample distance using a force sensing tuning fork. A tapered optical fiber, connected to 405 nm wavelength laser source, was aligned to the backside of the probe tip to serve as the light source. The transmitted light through the aperture was used to expose the photoresist (AZ 5209E), on a piece of cover glass attached on the tuning fork. The probe was controlled for near-field photolithography, where a series of 15 exposures, varied from 0 to 8 minutes, were carried out on the photoresist stepwise at 6.5 μm separation with subsequent 60 seconds development time. The transmitted light beam spot was simulated with a Full Width Half Maximum of 227 nm. Atomic Force Microscope measurement showed a 200 nm lateral resolution for the photolithography. The depths and widths of the developed patterns were linearly correlated with increasing exposure time, showing slopes of 0.76 nm/second and 1.4 nm/second respectively.

Paper Details

Date Published: 16 February 2010
PDF: 9 pages
Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 75910C (16 February 2010); doi: 10.1117/12.842625
Show Author Affiliations
Yu-Yen Huang, The Univ. of Texas at Austin (United States)
Yuyan Wang, The Univ. of Texas at Austin (United States)
Kazunori Hoshino, The Univ. of Texas at Austin (United States)
David Giese, The Univ. of Texas at Austin (United States)
Yujan Shrestha, The Univ. of Texas at Austin (United States)
Xiaojing Zhang, The Univ. of Texas at Austin (United States)


Published in SPIE Proceedings Vol. 7591:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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