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Proceedings Paper

The NSLS-II multilayer Laue lens deposition system
Author(s): Ray Conley; Nathalie Bouet; James Biancarosa; Qun Shen; Larry Boas; John Feraca; Leonard Rosenbaum
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Paper Abstract

The NSLS-II[1] program has a requirement for an unprecedented level of x-ray nanofocusing and has selected the wedged multilayer Laue lens[2,3] (MLL) as the optic of choice to meet this goal. In order to fabricate the MLL a deposition system capable of depositing depth-graded and laterally-graded multilayers with precise thickness control over many thousands of layers, with total film growth in one run up to 100μm thick or greater is required. This machine design expounds on the positive features of a rotary deposition system[4] constructed previously for MLLs and will contain multiple stationary, horizontally-oriented magnetron sources. A transport will move a substrate back and forth in a linear fashion over shaped apertures at well-defined velocities to affect a multilayer coating.

Paper Details

Date Published: 8 September 2009
PDF: 5 pages
Proc. SPIE 7448, Advances in X-Ray/EUV Optics and Components IV, 74480U (8 September 2009); doi: 10.1117/12.842076
Show Author Affiliations
Ray Conley, Brookhaven National Lab. (United States)
Nathalie Bouet, Brookhaven National Lab. (United States)
James Biancarosa, Brookhaven National Lab. (United States)
Qun Shen, Brookhaven National Lab. (United States)
Larry Boas, CVD Equipment Corp. (United States)
John Feraca, CVD Equipment Corp. (United States)
Leonard Rosenbaum, CVD Equipment Corp. (United States)


Published in SPIE Proceedings Vol. 7448:
Advances in X-Ray/EUV Optics and Components IV
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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