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Proceedings Paper

A novel fabrication process of polymeric photonic crystal
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Paper Abstract

Photonic crystals (PCs) are recently fabricated by the Nano Imprint Lithography (NIL) on the polymers with low indexes because of the simple and short process time and ease of precise manufacturing. But, PCs require high dimensional accuracy due to their optical characteristics. The dimensional accuracy of PCs using NIL depends on the stamp. NIL stamps are usually fabricated by EBL, lift off and etching process. The damage of PC structures happens during the lift off process due to the tearing and ripping problem. So, we report on novel fabrication of NIL stamp using PMGI/PMMA bi-layer lift off technique. We can control the extent of the undercut in the support layer through independent development of PMGI and PMMA. We simulate the band structure of a triangle lattice with a polymer refractive index of 1.495. From the simulation results, we derive that dimensional accuracy of PCs should be maintained below ±30 nm. We make the original pattern by EBL. An optimal dose for achieving this dimension on the PMMA is determined by experiment and has 110 μC/cm2 at the aperture 10 μm and EHT 20 kV. To establish optimal process condition, development for PMMA and PMGI is performed according to development time. Then, we deposit the Ni layer using e-beam evaporator and perform the lift off process. We can obtain the PCs structure of Ni metal layer with 70 nm undercut at the optimal development condition. The fabricated PCs structure has dimensional accuracy below 5 nm. These values are sufficient for meeting with optical characteristics of PCs.

Paper Details

Date Published: 15 February 2010
PDF: 8 pages
Proc. SPIE 7605, Optoelectronic Integrated Circuits XII, 76050S (15 February 2010); doi: 10.1117/12.841669
Show Author Affiliations
Seung Hun Oh, Pusan National Univ. (Korea, Republic of)
Chang Seok Kim, Pusan National Univ. (Korea, Republic of)
El-Hang Lee, Inha Univ. (Korea, Republic of)
Myung Yung Jeong, Pusan National Univ. (Korea, Republic of)

Published in SPIE Proceedings Vol. 7605:
Optoelectronic Integrated Circuits XII
Louay A. Eldada; El-Hang Lee, Editor(s)

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