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Proceedings Paper

Binocular adaptive optics visual simulator: understanding the impact of aberrations on actual vision
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Paper Abstract

A novel adaptive optics system is presented for the study of vision. The apparatus is capable for binocular operation. The binocular adaptive optics visual simulator permits measuring and manipulating ocular aberrations of the two eyes simultaneously. Aberrations can be corrected, or modified, while the subject performs visual testing under binocular vision. One of the most remarkable features of the apparatus consists on the use of a single correcting device, and a single wavefront sensor (Hartmann-Shack). Both the operation and the total cost of the instrument largely benefit from this attribute. The correcting device is a liquid-crystal-on-silicon (LCOS) spatial light modulator. The basic performance of the visual simulator consists in the simultaneous projection of the two eyes' pupils onto both the corrector and sensor. Examples of the potential of the apparatus for the study of the impact of the aberrations under binocular vision are presented. Measurements of contrast sensitivity with modified combinations of spherical aberration through focus are shown. Special attention was paid on the simulation of monovision, where one eye is corrected for far vision while the other is focused at near distance. The results suggest complex binocular interactions. The apparatus can be dedicated to the better understanding of the vision mechanism, which might have an important impact in developing new protocols and treatments for presbyopia. The technique and the instrument might contribute to search optimized ophthalmic corrections.

Paper Details

Date Published: 2 March 2010
PDF: 4 pages
Proc. SPIE 7550, Ophthalmic Technologies XX, 755014 (2 March 2010); doi: 10.1117/12.841638
Show Author Affiliations
Enrique J. Fernández, Univ. de Murcia (Spain)
Pedro M. Prieto, Univ. de Murcia (Spain)
Pablo Artal, Univ. de Murcia (Spain)


Published in SPIE Proceedings Vol. 7550:
Ophthalmic Technologies XX
Fabrice Manns; Per G. Söderberg; Arthur Ho, Editor(s)

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