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Proceedings Paper

Optical properties of atomic layer deposited materials and their application in silicon waveguides
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Paper Abstract

Atomic layer deposition (ALD) is a promising method to grow optical materials on waveguide structures. Propagation loss analysis indicates that amorphous TiO2 and Al2O3 films are promising for the waveguide purposes. Instead, polycrystalline ZnO does not work properly as a waveguide by itself, but the waveguiding properties can probably be enhanced by introducing intermediate Al2O3 layers. The wide variety of available materials, conformal growth properties and low scattering losses of many ALD films enable their usage in various waveguide applications. Experimental coating of silicon waveguides is discussed.

Paper Details

Date Published: 25 February 2010
PDF: 8 pages
Proc. SPIE 7598, Optical Components and Materials VII, 75980D (25 February 2010); doi: 10.1117/12.841524
Show Author Affiliations
Tapani Alasaarela, Helsinki Univ. of Technology (Finland)
Jussi Hiltunen, VTT Technical Research Ctr. of Finland (Finland)
Amit Khanna, Helsinki Univ. of Technology (Finland)
Antti Säynätjoki, Helsinki Univ. of Technology (Finland)
Ari Tervonen, Helsinki Univ. of Technology (Finland)
Seppo Honkanen, Helsinki Univ. of Technology (Finland)


Published in SPIE Proceedings Vol. 7598:
Optical Components and Materials VII
Shibin Jiang; Michel J. F. Digonnet; John W. Glesener; J. Christopher Dries, Editor(s)

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