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Proceedings Paper

Relaxation properties of dielectric dipoles of photo resist materials
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Paper Abstract

Relaxation properties of dielectric dipoles such as dielectric frequency dispersion, relaxation time, which should be optimized in structural material designing, are characterized. Relaxation times of dielectric dipoles of photo resist materials are characterized by Cole-Cole plot, which is employed to determine a dielectric relaxation time of dipole moment in polymer structure, based on traditional capacitance method in frequency range of 10mHz to 5MHz. The relaxation time of dry film resist (DFR) can be determined to be 12.1s. The validity of dielectric properties of DFR film as a structural material is discussed.

Paper Details

Date Published: 14 December 2009
PDF: 7 pages
Proc. SPIE 7520, Lithography Asia 2009, 75202X (14 December 2009); doi: 10.1117/12.841126
Show Author Affiliations
Hiroki Sasazaki, Nagaoka Univ. of Technology (Japan)
Akira Kawai, Nagaoka Univ. of Technology (Japan)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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