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Proceedings Paper

Durability of self-standing resist sheet composed with micro holes
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Paper Abstract

MEMS (Micro Electro Mechanical systems) technology has been widely employed for micro device fabrication. Polymer materials, such as photoresist resin, have been focused as permanent structural materials used for MEMS. It is required that the permanent structural materials are durable to employ to micro device component. We demonstrate that the mechanical strength of self-standing resist film is enhanced by forming hexagonal hole array. The destruction strength of the resist film is analyzed by peel destruction test. As a result, the enhancement of the self-standing resist film with patterning can be obtained.

Paper Details

Date Published: 14 December 2009
PDF: 9 pages
Proc. SPIE 7520, Lithography Asia 2009, 752032 (14 December 2009); doi: 10.1117/12.841091
Show Author Affiliations
Akihiro Takano, Nagaoka Univ. of Technology (Japan)
Akira Kawai, Nagaoka Univ. of Technology (Japan)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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