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Proceedings Paper

Back side photomask haze revisited
Author(s): Brian J. Grenon; Oleg Kishkovich
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Paper Abstract

Back (glass) side haze on photomasks has been previously reported and continues to present problems in many fabs throughout the industry. While some process changes have resulted in the reduction in both the occurrences and rate at which back side haze forms; proper handling and storage of reticles remains paramount in protecting all surfaces on the reticle from haze formation. We will describe again the basic mechanisms for haze formation and how proper storage can result in significantly reducing the risk of haze formation during storage and use in the fab.

Paper Details

Date Published: 11 December 2009
PDF: 12 pages
Proc. SPIE 7520, Lithography Asia 2009, 752018 (11 December 2009); doi: 10.1117/12.840273
Show Author Affiliations
Brian J. Grenon, Grenon Consulting, Inc. (United States)
Oleg Kishkovich, Entegris, Inc. (United States)

Published in SPIE Proceedings Vol. 7520:
Lithography Asia 2009
Alek C. Chen; Woo-Sung Han; Burn J. Lin; Anthony Yen, Editor(s)

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